課程資訊
課程名稱
 半導體製程中的輸送現象
Transport phenomena in semiconductor manufacturing 
開課學期
 111-1 
授課對象
 重點科技研究學院  奈米工程與科學碩士學位學程  
授課教師
 李 雨 
課號
 AM7191 
課程識別碼
 543EM5440 
班次
  
學分
 3.0 
全/半年
 半年 
必/選修
 選修 
上課時間
 星期二5,6,7(12:20~15:10) 
上課地點
 應109 
備註
 本課程以英語授課。
總人數上限：54人 
  
課程簡介影片
 
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課程大綱
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課程概述

A sequence of processes, including oxidation, photolithography, etching, doping, deposition and planarization on a wafer, performed in a clean-room environment, are involved in semiconductor manufacturing. All these processes, as well as the formation of the single-crystal ingot (wafers are sliced from it) and the clean-room design, are related to the transport phenomena of momentum (fluid mechanics), heat, and mass (including particulate matter). Understanding those transport phenomena is crucial for better design of the processes and products. The theme of this course is to study the transport phenomena in details of these processes, from the viewpoint of fluid mechanics. As the critical dimension of the semiconductor product decrease, mechanics in nano-scales related to the processes will also be addressed. Also discussed in the course is the environmental impact arising from the chemical wastes in semiconductor manufacturing. 

課程目標
 The goal of this course is to provide students knowledges of the transport phenomena for the processes in semiconductor manufacturing, which is helpful for a better design of applications. 
課程要求
 The students who take this course for credit should have certain knowledges in differential equations, fluid mechanics, and heat transfer. 
預期每週課後學習時數
 Six hours 
Office Hours
 每週三 13:00~15:00
每週一 13:00~14:00 
指定閱讀
 (1) Lecture notes, will be posted on NTUCOOL.
(2) Selected literatures, will be assigned in class. 
參考書目
 (1) Gary S. May and Simon M. Sze, “Fundamentals of semiconductor fabrication,” Wiley, 2004.
(2) Gary S. May and Costas J. Spanos, Fundamentals of semiconductor manufacturing and process control,” John Wiley and Sons, Inc., 2006.
(3) S. M. Sze and M. K. Lee, “Semiconductor Devices: Physics and Technology,” 3rd ed., John Wiley & Sons, Inc., 2012.
(4) Frank M. White, “Viscous fluid flow,” 2nd ed., McGraw-Hill, 1991.
(5) R. Byron Bird, Warren E. Stewart, and Edwin N, Lightfoot, “Transport phenomena,” 2nd ed., John-Wiley & Sons, Inc., 2002.
(6) Sheldon K, Friedlander, “Smokes, dusts, and haze – Fundamentals of aerosol dynamics,” 2nd ed., Oxford University Press, 2000.
(7) Richard W. Boubel, Donald L. Fox, D. Bruce Turner, and Arthur C. Stern, “Fundamentals of air pollution,”3rd ed., Academic Press 1994.
(8) Jacob N. Israelachvilli, “Intermolecular and surface forces,” 3rd ed., Academic press, 2011.
(9) U Lei, "Fluid Mechancis," Lecture Notes, Institute of Applied Mechanics, National Taiwan University, 2004. 
評量方式
(僅供參考)
  
No.
項目
百分比
說明
1. 
 Homework 
50% 
  
2. 
 Final Report 
50% 
  
 
針對學生困難提供學生調整方式
  
上課形式
作業繳交方式
考試形式
其他
 由師生雙方議定
課程進度
週次
日期
單元主題
第1週
 9/06  Introduction to semiconductor manufacturing, and the related transport phenomena. 
第2週
 9/13  Review in transport phenomena (fluid mechanics, heat transfer, and mass transfer). 
第3週
 9/20  Transport and collection of particulate matters. 
第4週
 9/27  Theory of particle filtration. Clean room technology. The HEPA and ULPA filters. 
第5週
 10/04  Crystal growth. 
第6週
 10/11  Photolithography. Spin coating. 
第7週
 10/18  Spin coating with mass transfer. 
第8週
 10/25  Silicon oxidation. 
第9週
 11/01  Etching (wet and dry etching). 
第10週
 11/08  Diffusion.  
第11週
 11/15  Ion implantation. 
第12週
 11/22  Film deposition: Physical and chemical vapor deposition. 
第13週
 11/29  Planarization. 
第14週
 12/06  Nanoscale mechanics.  
第15週
 12/13  Environmental impact. 
第16週
 12/20  Student presentation. 
第17週
 12/27  Student presentation. 
第18週
 1/03  Student presentation.